SPUTTER COATERS

K575XD Turbo-Pumped Dual Head Sputter Coater

The K575XD is a compact, dual head turbomolecular-pumped sputter coater optimised to deposit fine metal coatings for SEM, FEG-SEM and thin film applications. The K575XD has two independent sputtering heads, which allows sequential sputtering of two metals without the need to break vacuum.

The sputter coating process is completely automatic, making the K575XD ideal for inexperienced or occasional users. The K575XD is fitted as standard with chromium(Cr) and gold (Au) targets, but a wide range of oxidising and non-oxidising metals are available. .

Key Features

• High vacuum turbo pumping - allows sputtering of fine grain oxidising metals such as chromium (Cr)
• Dual sputtering heads - allows sequential coating of two metals without breaking vacuum
• Fully-automatic control - easy to set up and easy to run
• Menu-driven ‘user’ key inputs - easy operation by multiple users
• Peltier-cooled sputter head - no cooling water required
• Fine coating (order of 0.5nm chromium (Cr) grain size) - reproducible ultra high resolution coatings
• Rotating specimen stage 100mm/4"
• Rotate/tilt stage fitted as standard
• Wide choice of target materials
• Three-year warranty

Product Description

Cooled magnetron sputtering head At the heart of the K575XD are two highly efficient, cooled magnetron sputtering heads, designed to deposit a range of oxidising and non-oxidising metals. Chromium (Cr) and gold (Au) targets are fitted as standard, but the ‘quick change’ design allows a wide range of target materials to be used. The highly efficient peltier-cooled sputtering head does not require water cooling.

Rapid pumping

The K575XD uses a robust 90L/s turbomolecular pump, ‘backed’ by a 50L/m rotary pump (rotary pump needs to be ordered separately) with the complete pumping sequence being under automatic control. The vacuum chamber is 156mm/6” in diameter and incorporates a 105mm/4” diameter rotating specimen stage.

The process vacuum can be adjusted to suit conditions for chromium (Cr) and other oxidising metals, as well as gold (Au) targets and other non-oxidising metals. An integral Pirani vacuum gauge is included, for high vacuum measurement the optional EK4181 full range vacuum gauge can be fitted.

Fully-automatic control

Microprocessor control with automatic operation allows the operator to preset optimum process conditions. A gas bleed needle valve is fitted with electromagnetic valve back up.

Comprehensive options

Add-on accessories include carbon rod and carbon fibre attachments and a Film Thickness Monitor (FTM) package

Additional Information

Options and Accessories

SC7640-CF and SC7640-CR Carbon Accessory Power Supplies: The carbon attachment module is a cost-effective and efficient method of carbon evaporation for SEM and some TEM applications. It is used in conjunction with the K575XD, which provides the vacuum work-chamber for evaporation. The carbon attachment is available in two formats: carbon fibre (SC7640-CF) or carbon rod (SC7640-CR). A vacuum interlock is provided to ensure safe operation of the sputter coater or carbon accessory system. Out-gas and coat switches are provided for complete control of the evaporation sequence.

NB: We also offer ‘stand alone’ SEM carbon coaters, see Q150R and Q150T and Q150T ES.

K150X Film Thickness Monitor: The K150X consists of a control unit external to the K575XD and a crystal holder with an interconnection lead and oscillator. A vacuum collar is supplied to suit the appropriate instrument chamber, and the quartz crystal is mounted in the vacuum chamber so that one face of the crystal is exposed towards the deposition source.

The crystal is connected via a vacuum feed through to an external oscillator whose output is controlled by the frequency of crystal oscillation. As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. This ‘modification’ is used to determine the thickness of material deposited and is displayed digitally on the FTM module.

A4001301: 50mm Ø specimen stage for SEM stubs (for six stubs).

EK4225: Vacuum shutdown. Allows the K575XD to remain under vacuum when the turbomolecular pump is switched off. Helps to maintain chamber cleanliness and improve vacuum performance.

EK4181: Full range high vacuum gauge with independent display.

Sputter Targets: The K575XD is fitted as standard with a 0.2mm thick chromium (Cr) and 0.1mm gold (Au) sputter targets. Other targets include:

Aluminium (Al)
Chromium (Cr) (1.5mm thick)
Cobalt (Co)
Copper (Cu)
Gold (Au)
Gold/palladium (Au/Pd) (80:20)
Indium tin oxide (ITO)
Iridium (Ir)
Magnesium (Mg)
Molybdenum (Mo)
Nickel (Ni)
Platinum (Pt)
Platinum/palladium (Pt/Pd) (80:20)
Palladium (Pd)
Silver (Ag)
Tantalum (Ta)
Titanium (Ti)
Tungsten (W)