FEDELCO, S.L.


C/ Lago Constanza, 46
28017     Madrid

Tel: 91 408 16 25
Fax: 91 408 16 90

10:00 - 13:30 horas
14:30 - 17:30 horas
de lunes a viernes.

 


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SPUTTER COATERS K675X & K675CD


High Resolution Large Chamber Sputter Coaters

The K675X is a large chamber (300mm) fully-automatic, turbo-pumped sputter coater that allows complete 200mm/8” wafers to be coated with oxidising and non-oxidising metals.

The K675XD version also has two independently controlled sputtering heads.

Key Features
  • Three sputtering heads - ensures even coating of large specimens such as 200mm/8” wafers
  • Turbo pumping system - fine grain sputtering of oxidising metals such as chromium (Cr)
  • Fully-automatic control - easy to set up and easy to operate
  • Menu-driven 'user' key inputs - easy operation by multiple users
  • Peltier cooled sputter head - no cooling water required
  • Fine coating (order of 0.5nm chromium (Cr) grain size) - reproducible ultra high resolution coatings
  • Rotating specimen stage - ensures even sputter deposition
  • 300mm diameter chamber - easy loading and unloading of specimens such as 200mm/8” wafers
  • Three-year warranty
    •
    Product Description

    Triple magnetron target assembly

    The K675X has a triple magnetron target assembly which, together with a rotating specimen table, ensures even deposition of large specimens. It is not possible to sequentially sputter three different metals from each of the three sputtering heads (for sequential coating of two metals, see the K675XD). However, with the individual head selection option (EK4125) the operator can choose to sputter using all three of the heads, or, for economical sputtering of small specimens, a single head can be selected.

    Sputtering parameters (current and sputtering time) can be pre-set. The K675X can sputter noble metals such as gold (Au), platinum (Pt), palladium (Pd) etc and also target materials such as chromium (Cr) and aluminium (Al) that may need pre-cleaning to remove oxide layers. A triple shutter assembly is fitted to protect specimens during the target cleaning stage.

    K675XD Dual-head system for sequential coating

    The K675XD version has two independently controlled sputtering heads and enables the deposition of two sequential coating materials without the need to break vacuum. The K675XD is suitable for specimens up to 150mm/6” in diameter.

    Specification of K675X Sputtering Coater System
    • Instrument Case: 450mm W x 500mm D x 300mm H (Overall height of unit 630mm)
    • Work Chamber: Borosilicate Glass 300mm Dia. x 200mm H
    • Safety Shield: Polycarbonate.
    • Weight: 42Kg
    • Targets: Three x 54mm Dia. x 0.3mm Thick Chromium fitted as standard
    • Rotating Specimen Stage: Adjustable for 6 to 8 inch Wafers, Height spacing to target 60mm
    • Vacuum Gauge: Atmos. - 1 x 10-5 mbar
    • Deposition: 0 - 450mA
    • Deposition Rate: 0 - 15nm/minute
    • Sputter Timer: 0 - 4 minutes
    • Supply: 230 Volts 50Hz (8 Amp Max including pump)
    • Services
    • Argon: Nominal 10 psi
    • Nitrogen: Nominal 10 psi (Argon may be used as common gas)
    • Rotary Backing Pump: Two Stage Vacuum Pump No.2, 35L/Min complete with Vacuum Hose and Oil Mist Filter. 2m3/Hr.

     

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    F E D E L C O, S. L.

    Triple magnetron target assembly The K675X has a triple magnetron target assembly which, together with a rotating specimen table, ensures even deposition of large specimens. It is not possible to sequentially sputter three different metals from each of the three sputtering heads (for sequential coating of two metals, see the K675XD). However, with the individual head selection option (EK4125) the operator can choose to sputter using all three of the heads, or, for economical sputtering of small specimens, a single head can be selected. Sputtering parameters (current and sputtering time) can be pre-set. The K675X can sputter noble metals such as gold (Au), platinum (Pt), palladium (Pd) etc and also target materials such as chromium (Cr) and aluminium (Al) that may need pre-cleaning to remove oxide layers. A triple shutter assembly is fitted to protect specimens during the target cleaning stage. K675XD Dual-head system for sequential coating The K675XD version has two independently controlled sputtering heads and enables the deposition of two sequential coating materials without the need to break vacuum. The K675XD is suitable for specimens up to 150mm/6” in diameter.